| 炭黑-二氧化硅双相填料的结构与灰化性能研究 |
| Structure and Ashing Properties of Carbon Black-Silica Dual Phase Filler |
| 投稿时间:2020-05-26 修订日期:2020-05-26 |
| DOI:10.12136/j.issn.1000-890X.2021.08.0576 |
| 中文关键词: 炭黑-二氧化硅双相填料 微观结构 比表面积 灰化性能 |
| 英文关键词: carbon black-silica dual phase filler microstructure specific surface area ashing performance |
| 基金项目:国家自然科学基金青年科学基金资助项目(21704052) |
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| 中文摘要: |
| 通过傅里叶变换红外光谱(FTIR)、X射线光电子能谱(XPS)、氮吸附比表面积、透射电子显微镜(TEM)、扫描
电子显微镜(SEM)和原子力显微镜(AFM)分析研究3种炭黑-二氧化硅双相填料(CSDPF)(分别为CSDPF A,CSDPF B
和CSDPF C)的微观结构和灰化性能。FTIR和XPS分析结果显示,CSDPF含有炭黑和二氧化硅两种组分。SEM和TEM
分析结果显示,不同CSDPF的比表面积和灰化性能存在较大差异,随着灰化温度的升高,炭黑相先从CSDPF中去除,导致
CSDPF的比表面积增大,之后二氧化硅的烧结占主导,导致CSDPF的比表面积减小。SEM分析结果显示,在高温灰化时,
CSDPF A和CSDPF B首先形成球形聚集体,由于二氧化硅稳定性不同,球形聚集体可烧结形成更大的球形聚集体或片状
甚至网状结构,CSDPF C在灰化过程中形成蜂窝状结构且其变化较小。CSDPF A和CSDPF B中白炭黑大部分分布在其
内部,CSDPF C中白炭黑大部分分布在其表面。 |
| 英文摘要: |
| In this study,the microstructure and ashing properties of three kinds of carbon black-silica
dual phase fillers(CSDPF) including CSDPF A,CSDPF B and CSDPF C,were investigated by Fourier
transform infrared spectroscopy(FTIR),X-ray photoelectron spectroscopy(XPS),nitrogen adsorption
specific surface area test,transmission electron microscopy(TEM),scanning electron microscopy(SEM)
and atomic force microscopy(AFM). FTIR and XPS analysis results showed that CSDPF contained two
components:carbon black and silica. SEM and TEM analysis results showed that there was a big difference
in the specific surface area and ashing performance among different CSDPF fillers. As the ashing temperature
increasing,the carbon black phase was first removed from the CSDPF,resulting in an increase in the specific
surface area of the CSDPF,and then silica sintering became dominant,resulting in a decrease in the specific
surface area of the CSDPF. SEM analysis results showed that during high-temperature ashing,CSDPF A and
CSDPF B first formed spherical aggregates,and due to the different stability of silica,spherical aggregates
could be sintered to form larger spherical aggregates or flakes or even network structures. CSDPF C formed
a honeycomb structure during the ashing process,and its change was small. Moreover, most of the silica
component in CSDPF A and CSDPF B was distributed inside,and most of the silica in CSDPF C was
distributed on the surface. |
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